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The reliable and reproducible fabrication of nanostructures by stencil lithography (SL) faces three main challenges: the stability of the thin stencil membranes with nanoapertures, the blurring of the deposited structures, and the clogging of the nanoapertures in the stencil membranes. This study reports on these three important issues and presents corresponding solutions for the patterning of nanostructures...
We present an analysis on the blurring, electrical and optical properties of nanostructures fabricated by stencil lithography and their application for biomolecular sensing. We analyze the effect of the stencil-substrate gap on the blurring, then we present the fabrication and electrical characteristics of nanowires on plastic substrates, and finally, we demonstrate the application of nanodots for...
We present the fabrication process and electrical characterization of sub-100 nm scale Al nanowires (NWs) fabricated by stencil lithography (SL). We use a stencil with sub- 100 nm wide nanoslits patterned by focused ion beam (FIB) milling. The stencil is aligned and clamped onto a substrate containing predefined electrical contacts. Then a 60 nm-thick layer of Aluminum (Al) is deposited through the...
We have fabricated new and robust nanostencil membranes for the surface patterning of 100-nm scale Al wires on full wafer scale. The stencil membranes are mechanically reinforced with corrugations, making them more stable against accumulated stress. The apertures in the stencil are fabricated by a combination of UV lithography and focused ion beam milling, ranging from sub-100 nm to several microns...
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