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The effect of post-annealing on the structural and electrochromic properties of the Mo-doped V2O5 thin films was investigated in this paper. With varying the annealing temperature, the interlayer distance is increased from 1.16 (as-deposited) to 1.38 nm (annealing at 250 °C), and the enlarged interlayer spacing would facilitate ion movement in between the interlayers inside the electrochromic matrix...
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