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Silicon-doped TiO2 (Si–TiO2) and pure TiO2 films were deposited on titanium substrates by cathodic arc deposition technique. The surface characteristics of the films, such as surface topography, elemental composition and wettability, were studied. About 4.6 % Si was incorporated into the Si–TiO2 films with a water contact angle of about 83°. The adhesive behaviors of osteoblast-like MG63 cells on...
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