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1.5 um-thick MgNi films with ratio of Mg/Ni=2.5 have been sputtered on quartz substrates and hydrogenated at 0.8 MPa hydrogen pressure for 250 °C. It is shown that the decomposition of Mg2Ni and surface segregation of Mg occur during hydrogenation. For C-free MgNi films, the metallic Mg is bonded with oxygen and form non-permeable for hydrogen oxide layer. Carbon impurities modify surface hydrogen...
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