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Collisional atomic mixing at an interface induced by an ion beam is analysed by a dynamic Monte Carlo simulation. The target taken for the simulations is a metallic Zr(50nm)/Ni bilayer bombarded with different ions and energies in order to compare with experimental results. We discuss the dependence of the mixing rate with different microscopic parameters like the deposited energy by the ion, the...
Deposition and characterisation of amorphous plasma enhanced chemical vapour-deposited (PECVD) silicon oxide films suitable for integrated optics applications is reported. Film properties such as refractive index, density, growth rate, thickness, bonded hydrogen content and total stress are correlated to deposition parameters such as gas flow ratio and substrate temperature. The composition of the...
A dry-developed photosensitive polyimide process has been widely studied as a top surface imaging technique for photoresist applications in microsystem technology. Photografting of photoimageable polyimides are obtained by using a silicon-based monomer having methacrylate sensitizer group, analogous to that contained into the polyamic precursor resist. For this purpose standard UV lithography exposure...
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