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The 193 nm immersion lithography is becoming the most likely candidate to succeed 193 nm dry lithography, and may extend down to the 45 nm ITRS technology node or beyond. A 0.85 numerical aperture (NA) full field immersion exposure tool was constructed as engineering evaluation tool. With this tool, the imaging of 65 nm half pitch with the depth of focus of 750 nm was demonstrated with scanning exposures,...
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