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The magnetron sputtering technique was employed to prepare Zr-alloyed Cu thin films with Zr addition ranging from 0 to 7.0 at.%. Microstructure evolution with Zr doping was characterized by using the transmission electron microscope and atom probe tomography. Plastic deformation characteristics (hardness, strain rate sensitivity and activation volume) of the Cu-Zr alloyed films were examined by using...
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