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Random copolymers of methyl methacrylate and fluorinated polyhedral oligomeric silsesquioxane (F-POSS) were synthesized and the corresponding thin films were prepared from solvent casting. Their microstructure was confirmed by 1H NMR, elemental analysis and GPC. Separation occurs in the bulk of the film during solvent evaporation which can be evidenced by Transmission Electron Microscopy, TEM, with...
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