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Giant magnetoresistance (GMR) of Co and Fe-Co based structures with Cu and Au spacers were e-beam evaporated onto Si wafers. The thickness of layers was obtained from the simulation of X-ray reflectivity spectra. The GMR ratio was between 3.3 and 5.6 %. The effect of strain upon samples was studied in a bending configuration. The different dependences of coercivity (Hc) vs. strain were found. For...
Microelectromagnetic matrix fabricated by lithography patterning on Si chip for the manipulation and assembling of nanoparticles (NP) by local magnetic field created by current loaded thin film conductors is described. Co, Fe3O4 and CoFe2O4 NPs are manipulated by matrix elements - meanders, grids and ring traps loaded at the electromigration limit of Ag conductors. The design of matrix is based on...
Recently, Mo/Si multilayer reflectors have been gaining industry interest as a promising choice for the next generation extreme ultraviolet mask material for printing sub 70 nm feature size devices. A reactive ion etching system with optimized hardware using CHF 3 /Ar process regime shows the capability for highly anisotropic etching of sub 400 nm feature sizes in Mo/Si test multilayers...
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