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Very thin polydimethylsiloxane (PDMS)-layer with a mean thickness of 3–5nm was formed on Cu particles by using thermal evaporation of PDMS at 200°C under nitrogen atmosphere. Using X-ray photoelectron spectroscopy and FT-IR, it was shown that the dimethylsiloxane framework was sustained after evaporation of PDMS and its deposition on Cu particles. Initiation temperature for oxidation of Cu was shifted...
Atomic layer deposition (ALD) was used to deposit TiO2 on Ni particles, and the catalytic activity of Ni for CO2 reforming of methane (CRM) was evaluated. In the presence of TiO2 islands on Ni surfaces, the onset temperature of the CRM reaction was lower than that of bare Ni. During the CRM reaction, carbon was deposited on the surface of bare Ni, which reduced the catalytic activity of the surface...
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