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A filtered cathodic vacuum arc technique has been applied to synthesis iron-nitride thin films on silicon (100) substrate. Two approaches were carried out to introduce the nitrogen gas into the chamber to control the nitrogen content. Films with smooth surface containing α-Fe(N), α′-Fe(N), αʺ-Fe 16 N 2 , γ′-Fe 4 N, ζ-Fe 2 N, ɛ-Fe 3 N and γʺ-FeN phases have been...
FeN thin films were deposited on glass substrates by dc magnetron sputtering at different Ar/N 2 discharges. The composition, structure and the surface morphology of the films were characterized using X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and atomic force microscopy (AFM). Films deposited at different nitrogen pressures exhibited different structures with different...
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