The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
In order to remove the photoresist during the rework process, a dry rework is primarily used to ash the photoresist followed by a wet cleans process to remove the remaining organic residues. An effective process with very high particle removal efficiency (PRE) is desired at this surface cleaning step. A cleans process with lower PRE leaves particles on the wafer surface which create extra pattern...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.