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Titanium-doped indium oxide (ITiO) films were deposited on Corning glass 2000 substrates at room temperature by radio frequency magnetron sputtering followed by vacuum post-annealing. With increasing deposition power, the as-deposited films showed an increasingly crystalline nature. As-deposited amorphous ITiO films obtained at 20W began to crystallize at the annealing temperature of 155°C. Although...
Fabrication of solar cells on cheap plastics, due to its demand for a low temperature processing (~100?C) needs adaptation of the cell structure of the state-of-the-art high efficiency thin film silicon solar cells made at high temperature (200?C). Use of a double n-layer (n-?c-Si/n-a-Si) instead of a single n-?c-Si layer improves Voc from a low 0.66 V to 0.82 V in the as deposited state of an n-i-p...
Post-deposition thermal annealing studies, including gas effusion measurements, measurements of infrared absorption versus annealing state, cross-sectional transmission electron microscopy (X-TEM) and atomic force microscopy (AFM), are used for structural characterization of hydrogenated amorphous and microcrystalline silicon films, prepared by very high frequency plasma enhanced chemical vapor deposition...
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