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Regular stencil-type nanomasks with mask openings in the 60nm range were fabricated on Si(100) by self-assembly from a colloidal suspension of silica spheres in water. Masks were irradiated with high doses of keV C + ions at different implantation conditions. SEM and cross-sectional TEM investigations show strong changes of the mask geometry due to both a collective motion of spheres and the...
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