The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
We studied the homo-epitaxial growth of Si layers on crystalline Si(100) substrates in the temperature range from 420/spl deg/C to 510/spl deg/C using electron-cyclotron resonance chemical vapour deposition (ECRCVD). Above 480/spl deg/C the films grew epitaxially. Films deposited with a growth rate of 15 nm/min at 510/spl deg/C are of excellent crystallographic quality up to layer thicknesses as large...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.