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We have fabricated the Schottky photodiodes on GaN epitaxial wafer by using Ir/Pt contact. It was found that the transmittance of Ir/Pt film increased while the dark current became significantly smaller after annealing. The leakage current after annealing in O 2 was shown to be about four orders of magnitude smaller than that without annealing. With a −6 V applied bias, it was found that the...
GaN-based ultraviolet photodiodes with a semi-insulating Mg-doped GaN cap layer were fabricated and characterized. Dark leakage current of the aforementioned photodiodes was much smaller than that of the conventional ones without the Mg-doped GaN cap layer due to a thicker and higher potential barrier and less amounts of interface states after inserting the Mg-doped GaN cap layer. The ultraviolet...
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