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Swift heavy ion induced stress in a pulsed laser deposited textured ZnO thin film is reported. In situ X-ray diffraction (XRD) measurements are carried out during ion irradiation at incremented fluences under 120 MeV Ag +9 ions. The average grain size, lattice constant ‘c’, and stress in the film are calculated from the diffraction pattern. The nature of the stress is intrinsic and the origin...
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