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In e-beam physical vapour deposition (PVD) system 70 and 110 nm thick aluminium films are deposited on epi-polished fused silica and sapphire substrates. We compare average values of four surface morphology parameters: peak-to-peak height, average roughness, root mean square (RMS) roughness and grain size diameter measured on Al films fabricated in three temperatures 170, 297 and 450 K. Variable surface...
A new method of deposition of ultrasmooth silver nanolayers at pressures and temperatures above the sublimation point of water ice in electron-beam evaporator is proposed and discussed. We balance contradictory influences of several phenomena involved in physical vapour deposition process. Deposition of metal-dielectric multilayers on cooled substrates creates a problem with dimensional stability...
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