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In this paper, a systematic study has been performed for the etching of negative photoresist SU-8 2005 using inductively coupled plasma. The etching rate, vertical profile, surface and sidewall roughness of the waveguide were investigated as a function of the chamber pressure, the bias power, the antenna power, the ratio of flow rate of Ar to O2, and the etching time. The etching parameters were studied...
We obtain the repulsive Casimir force between two parallel gyroelectric slabs, thus overcoming the difficulty that the repulsive Casimir force is difficult to achieve in a naturally occurring material. Under practically realizable parameters, we realize the crossover from attractive (repulsive) to repulsive (attractive) forces by changing either the external static magnetic field, the background permittivity...
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