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The atomic layer deposition (ALD) of strontium borate films is carried out using bis(tris(pyrazolyl)borate)strontium (SrTp2) and water as precursors. Self‐limiting ALD growth is established at 350 °C with SrTp2 and water pulse lengths of ≥ 2.0 s and ≥ 0.3 s, respectively. An ALD window is observed from 300 to 375 °C, in which the growth rate is 0.47 Å per cycle. The thin film compositions are assessed...
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