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Surface roughness of polycrystalline Ag thin films frequently used in plasmonic applications can be considerably reduced with a Ge wetting interlayer, that inhibits island growth due to large Ag-Ge adhesion. However, segregation of Ge to the Ag free surface and grain boundaries leads to an increase of the specific resistivity and of the imaginary part of Ag permittivity in the 500 – 800 nm spectral...
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