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The Ni/Al multilayer coating of λ ≈100 nm was deposited onto (001)-oriented monocrystalline silicon substrate using double target magnetron sputtering system equipped with rotating sample holder. The thicknesses of alternating layers were adjusted in the way to preserve the chemical composition ratio close to 50%Al:50%Ni (at.%). The in situ X-ray diffraction and in situ transmission electron microscopy...
Multilayer amorphous TiB_{x}/TiSi_{y}C_{z} coatings were formed by duplex treatment: dual beam ion beam assisted deposition and pulsed laser deposition. Post-deposition heating was applied to activate crystallization in the coating. In situ transmission electron microscopy heating experiments were conducted in the temperature range 20-600°C. Crystallization of TiB₂ phase in TiB_{x} layers begun at...
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