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Amorphous C:S:N:H thin-film materials were produced from methyl, propyl-, allyl-, and phenyl isothiocyanate source compounds in plasma chemical vapor deposition (PCVD). The PCVD process was investigated in terms of the deposition yield and pressure increase in the reactor. These parameters provide insight into the mechanism of plasma activation of the organoisothiocyanates. The films are characterized...
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