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Extreme ultraviolet (EUV) radiation with wavelengths of 11 to 14 nm is seen as the most promising candidate for a new lithographic technology. Compared to synchrotron radiation sources and laser produced plasmas, gas discharge produced plasma (GDPP) sources for EUV radiation are expected to offer lower cost of ownership. This paper describes the dependence of EUV emission on gas flow rate. Using xenon...
Xenon capillary discharge sources are being developed for extreme ultraviolet (EUV) light for next generation lithography. However, the current sources generate in-band (2%), 2pi EUV emission with conversion efficiency (CE) of <1%. Here we report progress in the development of a Z-pinch EUV source using a tin target, which was found to have significant potential for high conversion efficiency with...
The concentration of the chemical furfural in transformer oil is well known to be an indicator of the extent to which the paper insulation of the windings has deteriorated. However, the majority of publications on this topic are based on small-scale laboratory investigations with very little on field experience with power transformers. This paper reports on the analysis of data on the concentration...
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