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In this work, the photocatalytic properties of Ti–V oxides thin films with 19 and 23 at.% of vanadium addition have been outlined. The films were deposited by the high energy reactive magnetron sputtering method. X-ray photoelectron spectroscopy measurements were done in order to determine the chemical composition and binding energy of the elements on the samples surface. Additionally, based on wettability...
This work is focused on structural and optical properties of TiO2 thin films doped with different amount of terbium. The thin films have been prepared by high energy reactive magnetron sputtering (HE RMS) and by low pressure hot target reactive magnetron sputtering (LP HTRS) processes. Thin films were deposited from mosaic, metallic Ti-Tb target sputtered under oxygen plasma (without argon) at a pressure...
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