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Low dielectric constant (low k) plasma polymerized methyl-cyclohexane (PPMCHex) thin films were deposited by inductively coupled plasma-enhanced chemical vapor deposition (ICPECVD). Effects of the inductively coupled plasma (ICP) power and the substrate bias (SB) power on the properties of PPMCHex thin films were investigated. As the ICP power or the SB power increased, the deposition rate and the...
The role of composition on the resistivity and thermal stability of sputtered Ta-Si-N films have been studied using X-ray diffraction, Rutherford backscattering spectrometry, and sheet resistance measurement. Films with higher silicon to tantalum ratio were found to be more thermally stable and have higher sheet resistance than films with lower Si to Ta ratio. While Ta 0.28 ...
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