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NiO ultrathin films have been grown on Pd(100) following a reactive deposition procedure. Ni has been dosed at room temperature on the substrate surface in an oxygen partial pressure of 4×10 −6 mbar. The electronic and structural evolution of the resulting NiO(100) ultrathin films has been followed by means of X-ray photoelectron spectroscopy (XPS), X-ray photoelectron diffraction (XPD), low...
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