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MgO thin films were deposited with r.f. magnetron sputtering method. Deposition parameters such as working pressure and r.f. power were found to influence properties of deposited films. As working pressure increased, crystallinity deteriorated while rms surface roughness decreased and film density increased. In this case, grain size did not change much compared with the case of r.f. power. On the...
Al 2 O 3 capping layer was deposited by DC reactive sputtering method on MgO protective layer deposited by RF magnetron sputtering method. Thickness of capping layer, Al 2 O 3 , was varied from 1 to 15 nm. Deposited MgO thin films were hydrated in the ambience of 80% humidity and at room temperature. Surface morphology and rms roughness were observed by SEM and AMF,...
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