The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
This paper reports a method of fabrication for small-feature-sized nickel (Ni) microbumps on gold (Au) using a newly developed technique called electroless Ni plating with noncontact induction (ENPNI). This technique, differing from conventional electroless Ni plating with contact induction (ENPCI), which directly connects an active metal with an inactive metal to induce Ni electrochemical reaction,...
Dry-etch for patterning Mo source/drain electrodes directly on amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistors (TFTs) with back-channel-etch (BCE) structure was investigated. The over-etching time of reactive ion etching (RIE) had a great influence on the performance of the BCE a-IGZO TFTs. The a-IGZO TFTs with an appropriate over-etching time, such as 20s, was observed with a field...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.