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One-dimensional metal lines of silver nanoparticles with a nano-sized width were generated onto silicon surface by using a nano-level lithography technique, field induced oxidation (FIO) by AFM, on self-assembled monolayer-modified Si wafers. This FIO technique provided SiO 2 lines a width of less than 100nm. Short-time immersion of partially anodized silicon surface which is covered by a...
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