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About 250 nm-thick Ni-doped ZnO:Al films were deposited on glass substrates at 300 K, 473 K and 673 K by direct current magnetron co-sputtering. Atomic ratio of Zn:Al:Ni in the film is 100:5:4. All the films have a ZnO wurtzite structure and grow mainly with their crystallographic c-axis perpendicular to the substrate. The films deposited at 300 K and 673 K consist of granular grains whereas the film...
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