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Tip‐Based Lithography
In article number 2309484, Jae‐Won Jang and co‐workers report the tip‐based lithography with a sacrificial layer. The sacrificial layer minimizes the scratching of the gold film by nano‐indentation during tip‐based lithography, which enables the fabrication of sub‐50 nm‐sized gold nanoholes. A single 20 nm diameter gold particle was trapped in a 35 nm diameter gold nanohole via...
The fabrication of a highly controlled gold (Au) nanohole (NH) array via tip‐based lithography is improved by incorporating a sacrificial layer—a tip‐crash buffer layer. This inclusion mitigates scratches during the nano‐indentation process by employing a 300 nm thick poly(methyl methacrylate) layer as a sacrificial layer on top of the Au film. Such a precaution ensures minimal scratches on the Au...
Methods for the mass fabrication of 3D silicon (Si) microstructures with a 100 nm resolution are developed using scanning probe lithography (SPL) combined with metal‐assisted chemical etching (MACE). Protruding Si structures, including Si nanowires of over 10 µm in length and atypical shaped Si nano‐ and micropillars, are obtained via the MACE of a patterned gold film (negative tone) on Si substrates...
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