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The gate oxide reliability and the electrical behavior of FinFETs are directly related to the surface characteristics of the fin vertical sidewalls. The surface roughness of the fin sidewalls is one of the most important structural parameters to be monitored in order to optimize the fin patterning and postetch treatments. Because of the nanometer-scale dimensions of the fins and the vertical orientation...
The average friction coefficient as a new parameter for surface characterization is presented. The measurement conditions for roughness were analysed and the importance of the applied force was proven. The quantitative measurements of friction force versus applied force are presented. We found that the average friction force linearly increased with applied force and was reversible with load. The connection...
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