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Rapid prototyping options provided by backside FIB preparation are expanded by trimming device delay to the desired quantity. Using inverter chains in 180 nm standard CMOS technology, proper FIB backside treatment is demonstrated to speed up or slow down devices by more than 20%. This result agrees well with device simulations and applies in principle to any technology. Devices from a 65 nm strained...
While the potential of FinFETs for large-scale integration (LSI) was demonstrated before on relaxed device dimensions, in this paper we present performance data of aggressively scaled transistors, ring oscillators and SRAM cells. FinFET SRAMs are shown to have excellent VDD scalability (SNM=185 mV at 0.6 V), enabling sub-32 nm low-voltage design.
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