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Nanocomposite tungsten‐aluminum oxide (W:Al2O3) thin films were prepared by atomic layer deposition (ALD) using tungsten hexafluoride (WF6) and disilane (Si2H6) for the W ALD and trimethyl aluminum (TMA) and H2O for the Al2O3 ALD. Quartz crystal microbalance (QCM) measurements performed using various W cycle percentages revealed that the W ALD inhibits the Al2O3 ALD and vice versa. Despite this inhibition,...