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An easy approach for the fabrication of titanium dioxide hollow spheres is proposed. Nanostructures were obtained by the conventional hard template method with silica-protected calcination. The samples were characterised by differential thermal analysis and thermogravimetry, Brunauer-Emmett-Teller nitrogen adsorption isotherms, X-ray diffraction, scanning and transmission electron microscopy (SEM...
In this work a very low cost and conventional technique was used to prepare Ge nano/microstructures by means of filling the material inside porous silicon (PS) using thermal evaporator. PS was prepared by anodization of Si wafer in ethanoic hydrofluoric acid (HF).The Ge layer was deposited onto the PS by thermal evaporation.Subsequent annealing at 650°C and 750 C for 30 mins were done to drive in...
Boron-doped nanodiamond (NCD) films were synthesized on silicon substrates by microwave plasma chemical vapor deposition (MPCVD) technique. The effect of vacuum annealing on the field emission characteristics of NCD films has been investigated. The surface morphology and quality of films was characterized by scanning electron microscope (SEM) and Raman spectroscopy. The SEM images clearly reveal formation...
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