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In this work, we report an efficient method of chemical vapour deposition, without use of any metal catalysts, for the successful synthesis of vertical graphene nanoflake films (GNFs) on Si substrate. Effects of the growth condition on the surface morphology, microstructure, and chemical composition of GNFs are characterized by using scanning electron microscopy, transmission electron microscopy,...
Silicon and its related alloys deposited by catalytic chemical vapor deposition (Cat-CVD), takes place upon thermo-catalytic decomposition of the reactant gases, i.e. silane (SiH4) and hydrogen (H2), at the surface of a hot filament. Tantalum (Ta) has been used as catalyst which resulted with better controllability from amorphous to crystalline-phase transition. Process for depositing hydrogenated...
Thin films of nanocrystalline CuGaS2 chalcopyrites have been prepared by chemical vapor transport (CVT) using elements of Cu, Ga, and S with iodine as the transporting agent. Crystalline layers of CuGaS2 have been grown using various iodine concentrations but with constant source materials, growth zones temperatures and growth durations. The films were grown onto sapphire (Al2O3) substrates. The deposits...
Polycrystalline diamond films have unique properties for applications in advanced electronic devices. Undoped and doped polycrystalline diamond films are deposited on p type Si (100) and n type SiC (6H) substrates at the low surface deposition temperatures of 370deg - 530degC using a microwave plasma enhanced chemical vapor deposition (MPECVD) system in which the surface temperatures during deposition...
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