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Electrical and optical properties of TiO2:Pd thin films deposited from Ti-Pd mosaic targets sputtered in reactive oxygen plasma have been studied. The properties were investigated for thin films with the Pd amount of 5.5 at. %, 8.4 at. % and 23 at. %. Based on resistivity measurements a drop from 103 down to almost 10−3Ωcm has been recorded when the Pd amount was varied from 5.5 at. % to 23 at. %,...
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