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Amorphous InGaZnO (a-IGZO) is a candidate material for thin-film transistors (TFTs) owing to its large electron mobility. The development of high functionality circuits requires accurate and efficient circuit simulation that, in turn, is based on compact physical a-IGZO TFTs models. Here we propose a compact physical-based and analytical model of the drain current of a-IGZO TFTs. The model accounts...
The proof of concept of a new extended-gate pH sensor, developed on an industrial ultrathin body and buried oxide (UTBB) fully-depleted silicon-on-insulator (FDSOI) transistor, is reported. The strong electrostatic coupling between the front gate and back gate of UTBB FDSOI devices provide a signal amplification opportunity for sensing applications. On the other hand, the biasing capability through...
For the first time the thermal stability of a new fluorine-free (F-free) W barrier coupled with W interconnections enabling 22% line 1 resistance improvement is evaluated in view of 3D VLSI integration. Integrated with ULK, no resistance nor lateral capacitance degradation is observed up to 550°C 5h while preserving good reliability. For additional thermal stability a TEOS/W stability is demonstrated...
This paper presents a wide-band RF shunt capacitive switch reconfigurable by means of electrically triggered Vanadium Oxide (VO2) phase transition to build a true-time delay (TTD) phase shifter. The concept of VO2-based reconfigurable shunt switch has been explained and experimentally demonstrated by designing, fabricating and characterizing an 819 μm long unit cell. The effect of bias voltage on...
We present a 5nm logic technology scaling step-up holistic approach for 5-track standard cell design employing electrically gate-all-around nanowire architecture (EGAA NW) with much reduced parasitic capacitance and increased effective width for better short channel control and stronger drive. We suggest SiGe P-channel by Ge Condensation for intrinsic mobility improvement and substrate strain, conformal...
Device modelling is a key enabling capability for the semiconductor industry, especially for process optimisation, and for insight into the physics of novel architectures and materials that are difficult to access experimentally. Despite much innovative experimental work, device modelling capabilities for field effect devices based on Transition Metal Dichalcogenide (TMD) channel materials are at...
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