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Silicon nanostructures were fabricated by a natural lithography technique, with sizes far beyond the limit of conventional, by a self-organizing gold colloidal particle monolayer as an etch mask. The silicon nanostructures with high density and uniformity in height and shape were obtained using reactive ion etching (RIE). The uniform spatial distribution of the Si nanostructures can also be obtained...
By introducing a broken geometric symmetry in a semiconductor nanochannel, we have realized an array of planar nano-diodes, called a self-switching device (SSD), using only one nanolithography step. Not only being much simpler than conventional diodes which generally require a multi-layer architecture and multi-step lithography, the SSD also possesses a very high operational speed because of the simplicity...
As the optical alignment system for lithography cannot be compatible with the equipment and the manufacturing process in nanofabrication with scanning probe microscope, new precision alignment methods are required. In this paper, we investigated ultra-precision alignment system especially to the overlay in SPL technology and completed the fabrication of two-layer graphics by AFM oxidation. On the...
There are serial structuring methods invented or used for the fabrication of nano structures. However, there is an urgent need for innovative processing technologies, including hybrid methods across multiple energetic domains, and three-dimensional imaging and fabrication technologies such as ultrasonics. This paper shows a novel method of nano island lithography to shape hemispherically islands of...
Using single-crystal Bi2S3 nanowires, we successfully fabricate nanodevices on Si substrate by e-beam lithography. Field-effect as well as novel optoelectronic properties have been obtained from the devices. Under visible or UV light illumination, the conductivity of Bi2S3 nanowire raises several to several orders times within milliseconds due to the generation of electron-hole pairs. Illuminating...
Three SPM-based techniques are put forward to fabricate 1D and 2D nanoscale reference materials, i.e. atomic force microscopy (AFM) tip-induced anodic oxidation on Si substrate, scanning tunneling microscopy (STM) current-induced oxidation on Ti film as well as AFM tip-scratching on Au film. The experimental parameters are analyzed and classified. For AFM tip-induced anodic oxidation on Si substrate...
In this paper, flow control of nano fountain pen using active membrane pumping is investigated. DPN (Dip Pen Nano- Lithography) has a shortcoming in which is the need of frequent loading and unloading while coating for broadband patterning. This issue is caused by a limit in quantity of ink, which is tied on the tip surface. The control of fluid injection using active membrane pumping in chambers...
In this paper we present a novel method of nano-imprinting which adopts important features of conventional nano-imprinting lithography (NIL) and the newly developed laser-assisted direct imprinting (LADI) method. It utilizes an Nd-YAG pulsed laser of wavelength 1064 nm which can easily penetrate and also heat up a silicon mold which is pressed against a resist layer deposited on a substrate. The fast...
Low-energy electron-beam (e-beam) lithography using ZEP-520 as a positive resist has been investigated in the energy range between 0.5 and 20 keV. The interaction between electrons and ZEP-520 resist, and its effect on the exposure dose and the penetration depth of the electrons have been studied as a function of electron energy. At 10 keV ~ 20 keV energy, we were able to achieve line gratings of...
Lack of batch-compatible fabrication techniques can be considered as the most important challenge in the integration of nanostructures with microelectromechanical systems (MEMS). A solution to the micro-nano integration problem is offered by introducing a batch-compatible nanowire fabrication technique based on basic lithographic techniques and guided self-assembly. The basic principle is obtaining...
In this paper, a MEMS method is developed to form suspended nano beams in 10 nm order width and thickness. The dimension of the nano beams is controlled precisely by employing traditional anisotropic self stopping etching instead of popular nano fabrication method such as e-beam lithography, which presents an opportunity for the future low cost batch product. The I-V measurements indicate that the...
A new localized surface plasmon resonance sensor fabricated by the nanoimprinting technique is presented. Nanoimprinting, one of the most important nanofabrication technologies, can produce stable nanopatterns on a substrate with high throughput. In this study, we apply this technique to the preparation of sensor chips for a low-cost and reliable biosensor. The optimal cross-sectional structure of...
In this study, we present the results of electroless deposition of silver (Ag) and electrophoretic deposition (EPD) of Al2O3 layers on glass for application in thin film transistor (TFT). Since silver with excellent resistivity is selected to be the material of electroless plating. We present a new method to deposit silver conductivity layer of TFT. Firstly, the desired pattern is defined by lithography...
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