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Increased packing density and reduced device size leads to increase in the back-end related delays. This happens as a result of increase in the metal resistance due to decreased line-width and increased capacitance due to a higher density of the interconnects. To minimize the impact of interconnect related delays (RC delay) the semiconductor industry had to, as a first order change, look for metal...
Failure analysis (FA) is key in root cause identification for any problem solving journey. Diagnosis given provides insights on mechanisms by which failures occur. This helps in determining factors that lead to the failure and consequently the root cause, thus easier to provide corrective actions. In mid June 2004, a sudden increase in test fall-outs was encountered. Several devices from different...
As IC manufacturing processes move to smaller feature sizes, fault isolation technique and debug become more and more challenging. In this paper, die level backside fault isolation case studies using emission microscope and scanning laser microscope are presented. They efficiently identified the fault sites in 0.13mum and 90nm products
X-ray photoelectron spectroscopy/electron spectroscopy for chemical analysis (XPS/ESCA) is being widely used in failure analysis of semiconductor industries and wafer fabrication, as it is able to provide not only elemental information, but also chemical binding information. For example, using its fingerprint of C=O, we are able to identify possible root causes of carbon contamination in wafer fabrication...
Nowadays, there are numbers of pad finishing types in market for ball grid array package (BGA). OSP (organic solderability preservatives) pad finishing technology is one of the most widely used for the purpose of increasing the joint strength and achieving more excellence in heat-resistance. Especially, to develop the ICs products to have compatibility with non-clean soldering fluxes and solder paste...
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