Effect of photonic crystal (PhC) patterned in the surface of the light emitting diode (LED) is intensively studied on light extraction and modification of radiation pattern. We present four different methods of PhC preparation (interference lithography (IL), near-field scanning optical microscope (NSOM) lithography, electron-beam direct writing lithography (EBDWL) and focused ion beam (FIB)) and their effect on emitting properties investigated by optical and electrical characterization and simulation. For the surface patterning we use triple quantum well GaAs/AlGaAs based LED emitting at 840 nm.