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Institut II-Experimentelle und Angewandte Physik, Universität Regensburg, Universitätsstraße 31, D-93040 Regensburg, Germany Instituto de Quı́mica Fisica “Rocasolano” CSIC, Serrano 119, E-28006 Madrid, Spain Instituto de Ciencia y Tecnologı́a de Polı́meros, CSIC, Juan de la Cierva 3, E-28006 Madrid, Spain Eastman Kodak Company, Rochester, NY 14630-1744, USA
Institut II-Experimentelle und Angewandte Physik, Universität Regensburg, Universitätsstraße 31, D-93040 Regensburg, Germany Instituto de Quı́mica Fisica “Rocasolano” CSIC, Serrano 119, E-28006 Madrid, Spain Instituto de Ciencia y Tecnologı́a de Polı́meros, CSIC, Juan de la Cierva 3, E-28006 Madrid, Spain Eastman Kodak Company, Rochester, NY 14630-1744, USA
Institut II-Experimentelle und Angewandte Physik, Universität Regensburg, Universitätsstraße 31, D-93040 Regensburg, Germany Instituto de Quı́mica Fisica “Rocasolano” CSIC, Serrano 119, E-28006 Madrid, Spain Instituto de Ciencia y Tecnologı́a de Polı́meros, CSIC, Juan de la Cierva 3, E-28006 Madrid, Spain Eastman Kodak Company, Rochester, NY 14630-1744, USA
Institut II-Experimentelle und Angewandte Physik, Universität Regensburg, Universitätsstraße 31, D-93040 Regensburg, Germany Instituto de Quı́mica Fisica “Rocasolano” CSIC, Serrano 119, E-28006 Madrid, Spain Instituto de Ciencia y Tecnologı́a de Polı́meros, CSIC, Juan de la Cierva 3, E-28006 Madrid, Spain Eastman Kodak Company, Rochester, NY 14630-1744, USA