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Thin films of indium oxide were prepared on alumina and silicon substrates by spin-coating from an aqueous acetic acid solution dissolving In(OH) 3 and ammonium carboxymethyl cellulose. The films could cover well the large grains of rough alumina as well as the flat surface of silicon. By changing the number of spin-coating, the film thickness was well controlled between 70nm and 210nm on...
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