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Niobium carbide thin films have been deposited on Si(100) substrates by direct current reactive magnetron sputtering using CH 4 as a carbon source. With increasing FCH4 from 4 to 22 sccm, the carbon content for the film increases from 32.7 to 68.7 at.% gradually, accompanying with a phase transition from hexagonal-Nb 2 C to cubic-NbC, and at the highest carbon content, the film exhibits...
Monolithically grown as well as multilayered Al x Cr 1−x N coatings were deposited by cathodic arc evaporation using Al x Cr 1−x targets with compositions of x = 0.7, 0.75, 0.85, and 0.9. X-ray diffraction analysis revealed a single phase cubic structure for the monolithically grown nitride coatings using Al 0.7 Cr 0.3 and Al 0.75 Cr 0.25...
A series of Ti–C x –N y films with different compositions were deposited by pulsed bias arc ion plating. In order to investigate their dependences on compositions, the surface morphology, composition, microstructure, and mechanical properties were assessed by means of scanning electron microscope, X-ray photoelectron spectroscopy, Raman spectroscopy, grazing incident X-ray diffraction,...
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