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UV-shielding TiO2 coatings for the protection of the UV-degradable transparent plastic polymethylmethacrylate (PMMA) were prepared by atmospheric-pressure plasma-enhanced chemical vapor deposition (AP-PECVD). The structure and morphology of AP-PECVD-derived TiO2 films and TiO2-coated PMMA were characterized by XRD, FTIR, SEM, and water contact angle measurements, and their optical properties were...
Transparent conductive CuAlO2 thin films prepared using atmospheric pressure plasma annealing are reported. The sol-gel-derived thin films on the quartz substrate were annealed using atmospheric pressure plasma of N2-10%O2 at 700–800 °C for 10 min. The CuAlO2 phase was obtained at 750 °C. The binding energies of the Cu-2p3/2 and the Al-2p3/2 of the thin films were centered at 932.6 ± 0.2 eV and 73...
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