A simple process to achieve patterned silica films is described. The patterning of the catalyst poly-l-lysine via photolithography and liftoff enables the spatial and geometrical control of silicification. Microscopy and chemical characterization demonstrate that this process enables consistent patterning of silica with 10μm resolution in a variety of geometries. In addition, the spatial and geometrical control of the silica is demonstrated under different reaction conditions and yields various silica morphologies. The ability to simultaneously pattern bio-inspired silica and control its morphology may allow the tailoring of silica and other silicon-based materials for future applications.