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Complementary X-ray photoelectron spectroscopy and optical reflectivity studies of crystalline Si(111) surfaces prepared by two different wet chemical etching processes were performed. These included aqueous HF solution etch or diluted CP-4 bath. Optical reflectivity spectra of Si surfaces, measured in the range 3.7-11 eV, were found strongly dependent on the applied etching process. Analysis of the...
The liquid nitrogen temperature reflectivity spectra of the tetrahedral diluted magnetic semiconductors (DMS's) Zn_{1-y}Fe_{y}Se and Zn_{1-x}Mn_{x}Se crystallizing in the zinc-blende structure were investigated. The reflectivity measurements for different concentration of Fe (y = 0.01, 0.05, and 0.10) and Mn (x = 0.10 and 0.30) ions were taken out in a wide energy range between 4 and 30 eV using synchrotron...
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