Inżynieria i Aparatura Chemiczna > 2010 > Nr 3 > 93-94
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journal ISSN : | 0368-0827 |
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[1] L. Wang, D.L. Marchisio, R.D. Vigil, R.O. Fox: J Colloid&Intcrface Sci. 380, 282 (2005).
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[2] L. Wang, R.D. Vigil, R.O. Fox: J Colloid&Interfacc Sci. 167, 285 (2005).
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[3] S.L. Conway, T. Shinbrot, B.J. Glasser: Nature, 433, 431 (2004).