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Imprint lithography has been included on the ITRS Lithography Roadmap at the 32 and 22nm nodes. Step and flash imprint lithography (S-FIL ™ ) is a unique method that has been designed from the beginning to enable precise overlay for creating multilevel devices. A photocurable low viscosity monomer is dispensed dropwise to meet the pattern density requirements of the device, thus enabling imprint...
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